On the afternoon of May 7,
2015, Hefei IC CAFé hosted its first academic activity at the Institute of
Advanced Technology of USTC in Hefei. Around 150 attendees, including top
experts in IC industry, professors, delegates from IC companies and students
attended the activity. Delegate from HFSID attended Hefei IC CAFé’s first activity.
This activity aims to demonstrate
the new IC industry dynamics and new trends of IC technologies and offer a communicating
platform for experts, companies, government and students. During the activity,
Lin Fujiang, member of Recruitment Program of Global Experts and Director of
USTC Center for Micro- and Nanoscale Research and Fabrication, delivered an
opening remark which introduced the history, status and future plan of USTC in research
of IC technology. The Principal Scientist of the Institute of Microelectronics
of the Chinese Academy of Sciences Zhu Huilong made a report on “FinFET and
CMOS Trends” and Yu Zhiping, Professor from Tsinghua University and member of Recruitment
Program of Global Experts, gave a lecture on “2D Martials: Beyond MOS Scaling”.
Furthermore, Ye Tianchun, the Director of the Institute of Microelectronics of
the Chinese Academy of Sciences, delivered a speech on “Status and Trends of
China IC Industry” and had a free and mutual discussion with the attendees on
IC issues, which was warmlywelcomed by all the attendees.
IC CAFé is the earliest
and most active entrepreneurial CAFé
and industrial club in electronics and information sector. It’s built by senior
management and professional insiders of ICT industry. IC CAFé dedicates to
gather elites in IC industry and leverage their talent and resource to build a platform for off-line net-working, technology
disseminating, incubating fledgling companies, investing and financing in order
to promote the development of China Hi-tech industry. At present, IC CAFé has
been established in Beijing, Shenzhen, Singapore, Silicon Valley and Hefei. 
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