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Symposium on Hefei ICC and Mentor EDA Was Held
Release date:2015-08-18 Browse the number:10762
On August 12,
2015, the Symposium on Hefei ICC and Mentor EDA was co-held by Hefei Consortium
of Integrated Circuits Technology Innovation and HFSID. Yuan Chen, the Associate
Consultant of Hefei Municipal Bureau of Science and Technology and concurrently
President of Hefei Consortium of Integrated Circuits Technology Innovation
attended the symposium and gave a speech. Delegates from Hefei Hi-tech Starting-up
Business Incubation and local IC companies like Lontium Semiconductor,Antece
Design, Xinfoo, Terawins etc. were invited to attended the symposium.
Liu Yan, Director
of Business Development of Mentor Graphics China Region introduced the status
quo of Mentor at the beginning of the symposium and then discussed with the
attendees on the meaning of building ICC and status quo of other cities’ICC.Liu
Yan also shared the experience on how to operate the ICC well with the
attendees and gave his advice on building and managing ICC to Hefei. Delegate
from Hefei Hi-tech Starting-up Business Incubation introduced their preparation
for building Hefei ICC to the attendees. Wang Yan, Deputy GM of Hefei Hi-tech
Starting-up Business Incubation stated that this symposium offers them a good opportunity
to communicate and will be conductive for Hefei to build the ICC better.On the
symposium, engineer from Mentor made a brief introduce about Mentor’s EDA tools
and conducted a technical exchange meeting to discuss about the problems
existing in the IC design processwith delegates from IC companies.
Yuan Chen said
that the advice gathering from attending delegates and useful experience
gathering from Mentoris meaningfulfor Hefei to build the ICC, and will help
Hefei to build the ICC more efficient and more close to meet IC companies’
demand.
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